Vacuum deposition method
We can handle over 50 types of thin film coatings, even from just one piece! Leave thin film formation to us!
A thin film, referred to as "hakumaku" or "usumaku," generally refers to a coating (film) with a thickness at the nano level. Thin films are formed by evaporating or sputtering the material (such as metal) that is to be made into a film within a vacuum apparatus. **"Vacuum Deposition Method"** The vacuum deposition method is a technique where the material (such as metal) intended for the film is heated and evaporated in a vacuum, allowing the vapor (particles) to reach the target object and accumulate to form a film. The vacuum deposition method is characterized by the fact that the vaporized material reaches the target object directly, resulting in minimal damage to the object and the formation of a highly pure film. Toho Kaken Co., Ltd. offers contract processing services for functional thin films with properties such as conductivity, insulation, and corrosion resistance using ion plating, vacuum deposition, P-CVD, and sputtering. We accommodate various functional thin films from prototyping to production. Based on our 35 years of experience, we offer flexible responses to film types, film thickness, deposition conditions, and compatible substrates (materials, sizes, shapes), and we also support masking deposition and pattern formation using metal masks. Please feel free to consult with us.
- Company：東邦化研
- Price：Other
